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Ceramic sputtering targetCeramic Sputtering Targets (Oxide sputtering target, Fluiride sputtering target, Boride sputtering target, Carbide sputtering target, Nitride sputtering target, Fluoride sputtering target, Silicide sputtering target, Sulfide sputtering target,Compound sputtering target...) China rare metal material co.,ltd offer a full serious ceramic sputtering target.Our brief manceramic sputtering targetufacture are melting, HIP,CIP,HP,Press-Sinter... CRM will base on performance select the best way to manufacture and sure our product be best. Also CRMcan base on customer's need and way to manufacture products.

OxideCeramic Sputtering Targets

Aluminum  Oxide (Al2O3) Niobium Pentoxide(Nb2O5)
Antimony  Oxide (Sb2O3) Magnesium Oxide(MgO)
Antimony:Tin Dioxide (Sb:SnO2)(ATO) Neodymium Oxide (Nd2O3)
Barium Titanate (BaTiO3) Nickel Oxide(NiO)
Bismuth Oxide (Bi2O3) Niobium Pentoxide(Nb2O5)
Cerium oxide (CeO2) Praseodymium Oxide (Pr6O11)
Cerium fluoride (CeF3) Samarium Oxide(Sm2O3)
Chromium Oxide (Cr2O3) Scandium Oxide (Sc2O3)
Copper Oxide (CuO) Silicon Monoxide(SiO)
Dysprosium Oxide (Dy2O3) Silicon Dioxide(SiO2)
Erbium Oxide(Er2O3) Strontium Titanate (SrTiO3)
Europium Oxide (Eu2O3) Tantalum Pentoxide (Ta2O5)
Gadolinium Oxide (Gd2O3) Terbium Oxide (Tb4O7)
Hafnium Oxide  (HfO2 ) Thulium Oxide (Tm2O3)
Holmium Oxide (Ho2O3) Titanium Oxide (Ti2O3)
Indium Tin Oxide(ITO) Titanium Oxide (Ti3O5)
Indium Zinc Oxide (IZO) Titanium Monoxide (TiO)
Indium Oxide(In2O3) Titanium Dioxide (TiO2)
Iron Oxide(Fe2O3) Tungsten Oxide (WO3)
Iron Oxide (Fe3O4) Tungsten Oxide (WO2.9)
Lanthanum Aluminate(LaAl2O3) Vanadium Pentoxide (V2O5)
Lead  Zirconate (PbZrO3) Yttrium oxide(Y2O3)
Lead Oxide (PbO) Ytterbium Oxide (Yb2O3)
Lead Titanate(PbTiO3) Zinc oxide (ZnO)
Lead Zirconate(PbZrO3) Zinc Aluminum Oxide (ZnO:Al) AZO
Lead zirconate+Lead Titanate (PbZrO3-PbTiO3) (PZT) Ga2O3 doped ZnO (GZO)
Lutetium Oxide (Lu2O3) IZO(Indium Zinc Oxide, 90 wt% In2O3 / 10 wt% ZnO)
Magnesium Oxide(MgO) Zirconium oxide (ZrO2)
Molybdenum Oxide (MoO) ZrO2 doped with Ti
Molybdenum Oxide MO3  ZrO2-Y2O3 stabilized (YSZ)
Neodymium Oxide (Nd2O3) ZrO2+SiO2
Nickel Oxide(NiO) La0.67Sr0.33MnO3(LSMO)
\ IGZO

Nitride Ceramic Sputtering Target

Aluminum Nitride (AlN) Tantalum Nitride (TaN)
Boron Nitride(BN) Titanium Carbonitride (TiCN)
Gadolinium Nitride (GaN) Titanium Nitride(TiN)
Hafnium Nitride(HfN) Vanadium Nitride (VN)
Niobium Niride (NbN) Zirconium Nitride (ZrN)
Silicom Nitride (Si3N4) \

Carbide Ceramic Sputtering Target

Boron Carbide(B4C) Titanium Carbonitride (TiCN)
Chromium Carbide (Cr3C2) Tungsten Carbide (W2C)
Hafnium Carbide(HfC) Tungsten Carbide (WC)
Molybdenum Carbide (Mo2C) Tungsten CarbideDoped with Nickel (WC+Ni)
Niobium Nitride (NbC) Tungsten Carbide Doped with Nickel (WC+Ni)
Silicom Carbide (SiC) Tungsten Carbide Doped with Cobalt (WC+Co)
Tantalum Carbide (TaC) Vanadium Carbide (VC)
Titanium Carbide(TiC) Zirconium Carbide(ZrC)

Fluoride Ceramic Sputtering Targer

Aluminum Fluiride (AlF3) Potassdium Fluoride (KF)
Barium Fluoride (BaF2) Praseodymium Fluoride (PrF3)
Cadmium Fuoride (CdF2) Lead Fluoride (PbF2)
Calcium Fluoride(CaF2) Sodium Fluride (NaF)
Cerium fluoride (CeF3) Strontium Fluoride (SrF3)
Dysprosium Fluoride (DyF3) Samarium Fluoride (SmF3)
Erbium Fluoride (ErF3) \
Hafnium Fluoride (HfF4) Cryolite Na3AlF6
Lanthanum  fluoride(LaF3) ThF4
Lithium Fluoride (LiF) Ytterbium  Fluoride (YbF3)
Magnesium fluoride  (MgF2) Yttrium Fluride (YF3)
Neodymium fluoride(NdF3) \

Silicide Ceramic Sputtering Target

Chromium Silicide (CrSi2) Tantalum Silicide (Ta5Si3)
Chromium Silicide (Cr2Si) Tantalum Silicide (TaSi2)
Cobalt Silicide (Co3Si) Titanium silicide(Ti5Si3)
HafniumSilicide (HfSi2) Titanium silicide(TiSi2)
Molybdenum silicide(Mo5Si3) Tungsten Silicide (WSi2)
Molybdenum Silicide(MoSi2) Tungsten Sulfide (WS2)
Nickel Silicide (NiSi) vanadium silicide (V3Si)
Niobium Silicide (Nb5Si3) Vanadium Silicide (VSi2)
Niobium Silicide(NbSi2) Zirconium Silicide (ZrSi2)

Sulfide Ceramic Sputtering Target

Aresenc Sulfide (As2S3) Manganese Sulfide(MnS2)
Antimony Sulfide (Sb2S3) Molybdenum Sulfide (MoS2)
Cadmium  Sulfide (CdS ) Niobium Sulfide (NbS1.75)
Indium Sulfide (In2S3) Tantalum Suflfide (TaS2)
Iron Sulfide(FeS) Tungsten Sulfide (WS2)
Lead Sulfide (PbS) Zinc Sulfide (ZnS)

Boride Ceramic Sputtering Target 

Chromium Boride (Cr2B) Neodymium Boride (NdB2)
Chromium Boride (CrB2) Tantalum Boride (TaB)
Chromium Boride (CrB) Tantalum Boride (TaB2)
Chromium Boride (Cr5B3) Titanium Boride(TiB2)
Hafnium Boride (HfB2) Tungsten Boride (WB)
Iron Boride (FeB) Tungsten Boride (WB2)
Lanthanum Boride (LaB6) Vanadium Boride (VB)
Molybdenum Boride (Mo2B) Vanadium Boride (VB2)
Molybdenum Boride (Mo2B5) Zirconium Boride (ZrB2)
Neodymium Boride (NdB) \

Selenide Ceramic Sputtering Target

Bismuth Selenide  (Bi2Se3) Molybdenum Selenide (MoSe2)
Cadmium Selenide (CdSe) Niobium Selenide (NbSe2)
Gallium Selenide (Ga2Se3) Tantalum Selenide (TaSe2)
Indium Selenide (In2Se3) Tungsten Selenide (WSe2)
Lead Selenide (PbSe) Zinc Selenide (ZnSe)

Telluride Sputtering Target

Aluminium Telluride (AlTe) Niobium Telluride (NbTe2)
Cadmium Telluride (CdTe) Tantalum Telluride ( TaTe2)
Lead Telluride (PbTe) Tungsten Telluride (WTe2)
Molybdenum Telluride (MoTe2) Zinc Telluride (ZnTe)

Antimonide Sputtering Target

Indium Antimonide (InSb) Nickel Antimonide (NiSb)
Gallium Antimonide (GaSb) \

Arsenide Sputtering Target

Indium Arsenide (InAs) Gallium Arsenide (GaAs)
Tin Arsenide (SnAs) \

Other Sputtering Target (Other Ceramac Target  and Compound Doped Target)

BaO, Cr-SiO
CaO YBCO
CuO/Al2O3 TiO2-Nb2O5
Ga-P LaNbO3
CuInO2 LiNbO3
InGaZnO SrZrO3
SrRuO3 SrBaTiO3,
InSn ¡¡
InP ¡¡
SrO ¡¡

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The last modified time: 2006-12-08 ÔÁICP±¸05013859ºÅ