Pure Metals/single element Sputtering Targets 

China rare metal material co.,ltd offer a full series of pure metals sputtering targets. Pure metal target and single elements target include low purity (industry class,99%,99.5%,99.9%),high pure (99.9%,99.95%,99.99%) and super/ultra high pure class(99.99%,99.995%99.999%,99.9995%,99.9999%).

Primary fabrication method: There 's special performance and special applied for every metal, So the fabrication methods are different. At present,primary fabrication show as below Vacuum Induction Melting (VIM),Vacuum induced levitation melting furnace, Vacuum Sintering, Vacuum Melting &Casting, Vacuum Arc Melting, Hot Pressing (HP), Hot Isostatic Pressing (HIP), Cold Isostatic Pressing(CIP)......

Diamenstion:

disk targets, column targets, step wafer targets,plate targets(Dia<350mm, Thickness >1mm )
Rectangle Targets, Slice Targets, Step Rectangle Targets (Longth <1500mm, Witdh<300mm, Thickness>1mm)
Tube Target / Rotation sputtering Target (Outer Dia < 300mm, Thickness > 2mm)
Pure Metals/single element Sputtering Targets List

high pure metal sputtering targets and single element sputtering targets include, rare earth metal sputtering targets,refractory metal sputtering targets,black metal sputtering targets,nobel sputtering targets,rare metal sputtering targets,base metal sputtering targets