CRM - Hafnium Oxide (HfO2) sputtering target, evaporation material
Homepage > EditRegion3

Hafnium Oxide (HfO2)

Base Information

Boiling Point: 5400 oC   

Melting Point: 2758 oC + 25 oC

Specific Gravity:9.68 at 20 oC      

Solubility in H2O:Insoluble       

Appearance and Odor:    White powder, pieces, and tablets, no odor 

Hafnium Oxide (HfO2) Sputtering Target 

Purity--- 99%, 99.9%,99.99%

Shape--- Discs, Rectangle, Rods, Pellets,  Irregular, Custom-Made

Dimension---

      Discs: Dia(≤360mm), Thickness(≥0.5mm)

      Rectangle: Length(600mm), Width(350mm), Thickness(≥0.5mm)

      Rods: Dia(≤360mm), Length(600mm)

      Pellets: Dia(≤360mm), Thickness(≥0.5mm)

Hafnium Oxide (HfO2) Evaporation Material
Density--- 9.68-9.90 g/cm3 Solubility---Insoluble in water
Purity---99.99% 

Melting point--- 2850 ℃ Vapour Pressureat 2678 ℃ 1 Pa,at 2875 ℃ 10 Pa

Linear expansion coefficient---5.6〜10-6/K
Properties of thin film
     Transmission range ~ 220~12000nm
     Refractive index at 250nm~ 2.15,  at 500nm ~ 2
Hints on evaporation
      Evaporation with electron-beam gun.
      Oxygen partial pressure ~ 1~2〜10-2 Pa
      Evaporation temperature ~ 2600 ~ 2800 ℃
      Substrate temperature~ 250 ℃
      Rate of deposition 2 nm/s
      Evaporate with low energy density. 

Shape---Solid substance, White or grey tablets, Powder

Application ---Anti-reflection coatings, interference coatings for the UV. 

Tel: 0086-791-88101311 Fax: 0086-791-88101211 E-mail: sales@china-raremetal.com

CopyRight ©2010 China Rare Metal Material Co.,Ltd 堊ICP姥05013859催