|
Base
Information
Boiling
Point: 5400 oC
Melting
Point: 2758 oC
+ 25 oC
Specific
Gravity:9.68 at 20 oC
Solubility
in H2O:Insoluble
Appearance
and Odor: White
powder, pieces, and tablets, no odor |
| Hafnium
Oxide (HfO2) Sputtering
Target
Purity---
99%, 99.9%,99.99%
Shape---
Discs, Rectangle, Rods, Pellets, Irregular, Custom-Made
Dimension---
Discs: Dia(≤360mm),
Thickness(≥0.5mm)
Rectangle:
Length(≤600mm),
Width(≤350mm),
Thickness(≥0.5mm)
Rods: Dia(≤360mm),
Length(≤600mm)
Pellets: Dia(≤360mm),
Thickness(≥0.5mm) |
|
Hafnium Oxide
(HfO2)
Evaporation Material
Density--- 9.68-9.90 g/cm3 Solubility---Insoluble in water
Purity---99.99%
Melting point--- 2850 ℃
Vapour Pressureat 2678 ℃ 1 Pa,at 2875 ℃ 10 Pa
Linear expansion coefficient---5.6¡Á10-6/K
Properties of thin film
Transmission range ~ 220~12000nm
Refractive index at 250nm~ 2.15, at
500nm ~ 2
Hints on evaporation
Evaporation with electron-beam gun.
Oxygen partial pressure ~ 1~2¡Á10-2
Pa
Evaporation temperature ~ 2600 ~ 2800 ℃
Substrate temperature~ 250 ℃
Rate of deposition 2 nm/s
Evaporate with low energy density.
Shape---Solid substance,
White or grey tablets, Powder
Application ---Anti-reflection
coatings, interference coatings for the UV. |