Zinc Telluride (ZnTe) Sputtering Targets |
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Zinc Telluride Sputtering targets - ZnTe Purity: 99.99% Denstiy: 6.34 g/cm3 Refractive Index: 3.56 Manufacturing Process: Material synthesis ---> Milling ---> HP(Vacuum) ---> Machining ---> Checking ---> Packing Speciafication (Max): Planar circular target: Dia ≤480mm, Thickness ≥1mm Planar Rectangle target: Length ≤420mm, Width ≤270mm, Thickness ≥1mm) Rotary Target: Diameter≤ 200mm, Thickness >2mm) Avialable Size: ( in sotre ) Zinc Telluride sputtering target 25.4mm DiaX 3.175mm thickness Zinc Telluride sputtering target 25.4mm Dia X 6.35mm thickness Zinc Telluride sputtering target 50.8mm DiaX 3.175mm thickness Zinc Telluride sputtering target 50.8mm Dia X 6.35mm thickness Zinc Telluride sputtering target 76.5mm Dia X 3.175mm thickness Zinc Telluride sputtering target 76.5mm Dia X 6/35mm thickness Zinc Telluride sputtering target 101.6mm Dia X 3.175mm thickness Zinc Telluride sputtering target 101.6mm Dia X 6.35mm thickness Zinc Telluride sputtering target 127mm Dia X 3.175mm thickness Zinc Telluride sputtering target 127mm Dia X 6.35mm thickness Zinc Telluride sputtering target 152.4mm Dia X 3.175mm thickness Zinc Telluride sputtering target 152.4mm Dia X 6.35mm thickness Zinc Telluride sputtering target 177.8mm Dia X 3.175mm thickness Zinc Telluride sputtering target 177.8mm Dia X 6.35mm thickness Zinc Telluride sputtering target 203.2mm Dia X 3.175mm thickness Zinc Telluride sputtering target 203.2mm Dia X 6.35mm thickness Custom-made Application: thin film of Solar cell |
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Our Advantage about Zinc Telluride Sputtering Targets China rare metal material co.,limited (CRM) is an experter in manufacture Zinc Telluride sputtering targets as Coating material . All Zinc Telluride sputtering targets are manufacture by programs with with the highest possible density and smallest possible average grain size.. CRM material co.,limited is specialized in making virous sputtering targets. We have many raw material compounds line, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special pellets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship. All Zinc Telluride sputtering targets are analyzed using best detection means including chemical analysis, Crystal phase microscope, x ray diffraction(XRD), X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). |
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Reference Information about Zinc Telluride Sputtering targets - ZnTe Zinc Telluride is a binary chemical compound with the formula ZnTe. This solid is a semiconductor material with a direct band gap of 2.26 eV. It is usually a p-type semiconductor. Its crystal structure is cubic, like that for sphalerite and diamond. ZnTe has the appearance of grey or brownish-red powder, or ruby-red crystals when refined by sublimation. Zinc telluride typically had a cubic (sphalerite, or "zincblende") crystal structure, but can be also prepared as rocksalt crystals or in hexagonal crystals (wurtzite structure). Irradiated by a strong optical beam burns in presence of oxygen. Its lattice constant is 0.6101 nm, allowing it to be grown with or on aluminium antimonide, gallium antimonide, indium arsenide, and lead selenide. With some lattice mismatch, it can also be grown on other substrates such as GaAs, and it can be grown in thin-film polycrystalline (or nanocrystalline) form on substrates such as glass, for example, in the manufacture of thin-film solar cells. In the wurtzite (hexagonal) crystal structure, it has lattice parameters a = 0.427 and c = 0.699 nm.
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