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Zinc Aluminum (ZnAl) Alloy Targets |
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Zinc Aluminum (ZnAl) Alloy Sputtering Targets Purity--- 99.99% Manufacturing Process Melting ---> Casting ---> Forging (Rolling) ---> Machining ---> Checking ---> Packing Speciafication Planar circular target: Dia ≤480mm, Thickness ≥1mm Planar Rectangle: Length ≤1800mm, Width ≤300mm, Thickness ≥1mm) Rotary Target: Diameter≤ 200mm, Thickness >2mm) Application --- thin film Capacitor... |
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Phase Diagram of Zinc Aluminum (ZnAl) Alloy Sputtering Targets
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Our Advantage about Zinc Aluminum (ZnAl) Alloy Sputtering Targets China rare metal material co.,limited (CRM) is an experter in manufacture Zinc aluminum sputtering targets as evaporation material . All Zinc aluminum sputtering targets are manufacture by programs with with the highest possible density and smallest possible average grain size.. CRM material co.,limited is specialized in making virous sputtering targets. We have many raw material compounds line, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special pellets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship. All Zinc aluminum sputtering targets are analyzed using best detection means including chemical analysis, Crystal phase microscope, x ray diffraction(XRD), X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). |
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Reference information about Zinc Aluminum (ZnAl) Alloy Sputtering Targets
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