Magnesium Nitride (Mg3N2)

Magnesium nitride, which possesses the chemical formula Mg3N2, is an inorganic compound of magnesium and nitrogen. At room temperature and pressure it is a greenish yellow powder.

Magnesium nitride was the catalyst in the first practical synthesis of borazon (cubic boron nitride).

Magnesium nitride reacts with water to produce magnesium hydroxide and ammonia gas, as do many metal nitrides.
Mg3N2(s) + 6 H2O(l) → 3 Mg(OH)2(aq) + 2 NH3(g)
In fact, when magnesium is burned in air, some magnesium nitride is formed in addition to the principal product, magnesium oxide.

Base Information

IUPAC name：Magnesium nitride
CAS Number：12057-71-5
ECHA InfoCard：100.031.826
PubChem CID：16212682

Chemical formula：Mg3N2

Magnesium Nitride Sputtering Targets - Mg3N2

Purity--- 99.5%

Shape --- Discs, Plate,Step (Dia ≤480mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤400mm, Width ≤300mm, Thickness ≥1mm)

Magnesium Nitride Evaporation Material  - Mg3N2

Purity - 99.5%

Size - 1-10mm

Application -

Magnesium Nitride Powder  - Mg3N2

Purity ---99.5%

Diameter --- 325mesh or other

Relation Products:

Aluminum Nitride (AlN) Sputtering Targets;

Boron Nitride (BN) Sputtering Targets;

Chrominium Nitride (CrN) Sputtering Targets;

Gallium Nitride (GaN) Sputtering Targets;

Germanium Nitride (Ge3N4) Sputtering targets;

Hafnium Nitride (HfN) Sputtering Targets;

Magnesium Nitride (Mg2N3) Sputtering Targets;

Niobium Niride (NbN) Sputtering Targets;

Silicom Nitride (Si3N4) Sputtering Targets;

Tantalum Nitride (TaN) Sputtering Targets;

Titanium Carbonitride (TiCN);

Titanium Nitride(TiN) Sputtering Targets;

Vanadium Nitride (VN) Sputtering Targets;

Zirconium Nitride (ZrN) Sputtering Targets;