Boron Carbide (B4C) 

Boron carbide ( B4C) is an extremely hard ceramic material used in tank armor, bulletproof vests, and numerous industrial applications. With a hardness of 9.3 on the mohs scale, it is one of the hardest materials known, behind cubic boron nitride and diamond.

Boron carbide was discovered in the 19th century as a by-product of reactions involving metal borides, however, its chemical formula was unknown. It was not until the 1930s that the formula was determined to be B4C.Boron carbide is now produced industrially by the carbothermal reduction of B2O3 (boron oxide) in an electric arc furnace.

Its ability to absorb neutrons without forming long lived radionuclides makes the material attractive as an absorbent for neutron radiation arising in nuclear power plants. Nuclear applications of boron carbide include shielding, control rod and shut down pellets. Within control rods, boron carbide is often powdered, to increase its surface area.

Basic Information

Boron Carbiide Sputtering targets - B4C

Purity--- 99.5%     Density ---2.51g/cc

Shape--- Discs, Plate, Step ( Dia ≤ 300mm,,  Thickness ≥ 1mm)

                        Rectangle, Sheet,  Step ( Length≤1000mm,Width ≤300mm, Thickness ≥1mm)

                        Tube( Diameter< 300mm,  Thickness >2mm, )

Application --- B4C in general are used for wear-resistant films and semi-conducting films.

B4C are used as diffusion barriers in both silicon and III-V device technology in multilevel metallization schemes involving aluminum as a second level.

Boron Carbiide Evaporation Material - B4C

Purity--- 99.5%     Density ---2.51g/cc

Shape--- Discs, Plate, Step ( Dia ≤ 300mm,,  Thickness ≥ 1mm)

                        Rectangle, Sheet,  Step ( Length≤1000mm,Width ≤300mm, Thickness ≥1mm)

                        Tube( Diameter< 300mm,  Thickness >2mm, )

Application --- B4C in general are used for wear-resistant films and semi-conducting films.

B4C are used as diffusion barriers in both silicon and III-V device technology in multilevel metallization schemes involving aluminum as a second level.

Boron Carbiide Powder - B4C

Purity--- 99.5%,98%     

Shape--- Powder

Relation Products:

Boron sputtering targets

Boron carbide sputtering target

Boron Nitride sputtering target

Lathanum boride sputtering targets;

Molybdenum boride sputtering targets;

Titanium Aluminum Boron Sputtering Targets;

Titanium Boride sputtering targets;

Tungsten boride sputtering targets;

Zirconium Boride Sputtering targets