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Tungsten Titanium Alloy (WTi)

Tugsten-Titanium material can be produced by either Hot Pressing (HP) or Hot Isostatic Pressing  (HIP). WTi alloy is a very importment in industry.

High purity tungsten titanium alloy target composite target are generally used to produce various thin-film material by the method of magnetron sputtering.Ultrapure tungsten( 5N or 6 N),due to their high resistance, high temperature stability to the electron transfer,thus in the electronic industry, most of them are used as gate, connection and obstruction materials in the form of sputtering thin films. Tungsten-Titanium alloy sputtering target is generally used for the production of the transition metal layer of thin film type solar cells.

According to different application purposes, there is corresponding requirement regarding impurity content of high purity Tungsten Titanium target.The chemical purity degree ranging from 99.99% to 99.999%, meanwhile special customized specification is also available for customers' requests

WTi Sputtering Target

Tungsten Titanium Alloy Sputtering Target ( WTi Targets )

Purity --- > 99.995% (Li,Na,K,Na<0.5 ppm), 99.99%(Type1 Na = 300-500 ppm) (type2 Na<10), W/Ti 90/10 wt%, 80/20wt%

Density --- >14.44g/cm3

Shape --- Discs, Plate,Step,Taper (Dia≤460mm,Thickness ≥1mm)
Rectangle, Sheet,Step (Length≤410mm, Width ≤350mm, Thickness≥1mm)

Tube(Diameter< 300mm, Thickness >2mm, rotary target)

Application --- Coating for Semiconductor, be used as diffusion barrier for advanced packaging( primarily between Pt silicide contacts and other interconnects.), e.g. Flip-Chip technology, and in a variety of compounds. 

Impurity Contents 99.995% (in ppm) --- C: 80, N: 90, O:1100, S:20, H:100, Cl: 2 , P: 2, Fe: 200, Mn: 80, Si: 100, F,Na,La,K: 0

Tungsten Titanium (WTi) Alloy

Purity---90/10 wt%, 80/20wt%, custom-made

Shape---Discs, Rectangle, Step, Plates, Sheets, Rods, As drawing.

Application--- Wearable part of horologe, garnishry and other

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