Tin Oxide sputering target,Tin Dioxide, high pure Tin oxide powder,SnO2 target,SnO2 powder - CRM
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Tin Dioxide (SnO2)

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Tin Dioxide (SnO2) Sputtering Target

Purity--- 99%, 99.9%,99.99%   

Denstiy--- 6.85 g/cm3

Refractive Index---

Transparence Wave Band---- um

Shape---Disk, Plate, sheet, Custom-made 

Diameter---Dia (102mm), Length---(102mm), Width---(102mm), Thickness---(2mm)

Application--- Transparent conductive film. 

Tin Dioxide (SnO2) Powder
Purity---99.9%,99.999%,99.9999%

Size--- 80-200mesh

Melting point--->1930℃

Application ---Tin dioxide is primarily used in the manufacture of gas sensitivity elements, pressure sensitivity elements, photosensitivity elements, semiconductor electronic elements, electrode materials and ITO(Indium Tin Oxide).

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