Aluminum Oxide (Al2O3)

Aluminum Oxide Sputtering Targets - Al2O3 target

Purity--- 99%, 99.9%, 99.99%, or International standards type

Shape--- Discs, Plate,Step ( Dia ≤300mm,,  Thickness ≥ 1mm)

                Rectangle, Sheet, Step (Length ≤300mm, Width ≤200mm, Thickness ≥1mm) 

Relation products:

AZO target, SiO2 target, ITO target, C target

Aluminum Oxide doped Titanium Sputtering Targets - Al2O3 +Ti target

Purity--- 99%, 99.9%, 99.99%, or International standards type

Shape--- Discs, Plate,Step ( Dia ≤300mm,,  Thickness ≥ 1mm)

                Rectangle, Sheet, Step (Length ≤300mm, Width ≤200mm, Thickness ≥1mm) 

Relation products:

AZO target, SiO2 target, ITO target, C target

Aluminum Oxide Evaporation Materials 

Purity--- 99%, 99.9%, 99.99% or International standards type

Shape--- White Granules, Irregular pieces, Cylinder, Pellet, Taper, Custom-Made

Dimension---Custom-Made 

Melting Point--- 2040 °C   Boiling Point--- 5500 °C 
Density @ 293 K--- 3.97 g/cm3

Evaporation temperature---Vapour pressure 1 Pa at 1900℃,10 Pa at 2200℃
Coefficient of linear thermal expansion ---at 50℃ 6.1×10-6/K
Specific heat capacity--- at 27℃ 0.78 J/gK
Hardness ---(acc. to Mohs) 9, (acc. to Knoop) 1370 Kg/mm2
Properties of thin film---
   Transmission range ～ 200～5000nm
   Refractive index at 500nm
   Substrate temperature 30℃ 1.60
   Substrate temperature 300℃ 1.63
Hints on evaporation---

   Evaporation with electron beam gun
   Evaporation temperature ～ 2000～2200℃
   Deposition rate ～1 nm/s
   Oxygen partial pressure ～ 10-2Pa

Application--- Anti-reflection coatings, multilayers, interference films, protective films etc  

Aluminum Oxide Ceramic Products

Purity--- 95, 99%, or International standards type

Shape--- Crucibles ,on drawing

Dimension---Custom-Made 

Single Crystal Aluminum Oxide  ( Sapphire) 

Purity--->99.99%    Shape---Wafer, Rod, Rectange

Dimension---Wafer: Dia<3", thickness>0.3mm         Rod: Dia<30mm ,Longth<150mm

Purity--->99.99%

Shape---Wafer, Rod, Rectange

Dimension---Wafer: Dia<3", thickness>0.3mm         Rod: Dia<30mm ,Longth<150mm  

Purity---99.99% Shape---300mesh

Purity---99.999% D50--- 10-15um Bet---4-5 m2/g
App--- alumina ultra high pure micron powder are mainly used for raw of crystal, artificial lens、raw materials for PDP and other high performance material.

Purity--->99.99% Shape---300mesh

Aluminum Oxide Nanometer Powder ( Al2O3 Nano-powder )　

Content of zirconia (%) --- 99.9     Appearance --- White powder     

Average grain size (nm) --- 20        Specific surface area (m2/g) --- ≥25

Loss of weight in drying (%) --- ≤2      Loss of weight in burning (%) --- ≤0.3

Crystal pattern --- Monoclinic

Appearance ---White powder

Content of zirconia (%) --- 99.8      Appearance --- White powder     

Average grain size (nm) --- 40     Specific surface area (m2/g ) --- ≥20

Loss of weight in drying (%) --- ≤2

Loss of weight in burning (%) ---≤0.3 

(1) Functional ceramics, ceramic pigment, high-purity pigment, porce lain glaze.
(2) Pyrooptical element, oxygen-sensitive element, high-capacity capacitor, optical storage, image display element, light modulated element, light shutter, stereotelevision glasses, image storage and display element.
(3) Abrasive material, insulating material, fire-retarding material, roentgenograply.
(4) High-temperature and corrosion resisting components, bearing nozzle, smelting crucible.
(5) Piezoelectric element, ion exchanger, solid dielectric, filter, temperature and pressure transmitters and transmitting elements, electrode used for magnetic-current generator, heating element.
(6) Single crystal, ruby,  sapphire, artificial jewel, catalyzer,  catalysing carrier, analyse reagent
(7) Fuel, battery.

(8)Thermal Spraying Coating material