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Zirconium Diboride (ZrB2) Evaporation Material |
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Zirconium Diboride Evaporation Material (ZrB2 granule) Purity --- 99.5% Manufacturing Process Granule: HP/CIP Sinter---> Crush ---> Screening ---> Checking ---> Packing Talbed: Material synthesis ---> Milling ---> Screening ---> CP(Forming) ---> Sinter ---> Checking ---> Packing Specification Granular: 3-6mm, 1-10mm, 6-50mm, Tablet: Dia10mmX5mm, custom-made Applications--- |
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Our Advantage about Zirconium Diboride Evaporation Material (ZrB2 granule) Zirconium Diboride (ZrB2) is a highly covalent refractory ceramic material with a hexagonal crystal structure. ZrB2 is an Ultra High Temperature Ceramic(UHTC) with a melting point of 3246°C. This along with its relatively low density of ~6.09 g/cm3 (Measured density may be higher due to Hafnium impurities) and good high temperature strength makes it a candidate for high temperature aerospace applications such as ultrasonic flight or rocket propulsion systems. ZrB2 parts are usually hot pressed (Pressure applied to the powder with heat being applied) and then machined to shape. Sintering of ZrB2 is hindered by the material's covalent nature and presence of surface oxides which increase grain coarsening before densification during sintering. Pressureless sintering of ZrB2 is possible with sintering additives such as Boron carbide and Carbon which react with the surface oxides to increase the driving force for sintering but mechanical properties are degraded compared to hot pressed ZrB2. Additions of ~30vol% SiC to ZrB2 is often added to ZrB2 to improve oxidation resistance through SiC creating a protective oxide layer - similar to aluminum's protective alumina layer. Basic Information
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Relation Products of Zirconium Diboride Evaporation Material (ZrB2 granule) Boron carbide sputtering target - B4C; Boron Nitride sputtering target - BN; Aluminium Diboride Sputtering target - AlB2; Cerium Hexaboride sputtering targets - CeB6; Chrominium Boride sputtering targets - CrB; Cobalt Boride sputtering target - CoB; Hafnium Diboride (HfB2) Sputtering Target - HfB2; Iron Boride sputtering targets - FeB; Lathanum Hexaboride sputtering targets - LaB6; Magnesium Diboride sputtering targets - MgB2; Molybdenum Diboride sputtering targets - MoB2; Neodymium Boride (NdB) Sputtering Target; Nickel Boride sputtering targets -Ni2B; Niobium Diboride (NbB2) Sputtering target - NbB2; Tantalum Diboride Sputterng target - TaB2; Titanium Aluminum Boron Sputtering Targets - TiAlB; Titanium Diboride sputtering targets - TiB2; Tungsten Diboride Sputtering tarets - WB2; Vanadium Boride (VB2) Sputtering Target - VB / VB2; Zirconium Diboride Sputtering targets - ZrB2; Relation Material Zirconium Aluminium alloy - ZrAl Zirconium Niobium Alloy - ZrNb Zirconium Silicon Alloy - ZrSi Zirconium Ytterium Alloy - ZrY
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