Zirconium Carbide (ZrC) Sputtering Targets |
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Zirconium Carbide (ZrC) Sputtering targets
Purity: 99.5% Manufacturing Process: Material synthesis ---> Milling ---> HP(Vacuum) ---> Machining ---> Checking ---> Packing Speciafication (Max): Planar circular target: Dia ≤480mm, Thickness ≥1mm Planar Rectangle target: Length ≤420mm, Width ≤270mm, Thickness ≥1mm) Rotary Target: Diameter≤ 200mm, Thickness >2mm) Avialable Size: ( in sotre ) Zirconium Carbide sputtering target 25.4mm DiaX 3.175mm thickness Zirconium Carbide sputtering target 25.4mm Dia X 6.35mm thickness Zirconium Carbide sputtering target 50.8mm DiaX 3.175mm thickness Zirconium Carbide sputtering target 50.8mm Dia X 6.35mm thickness Zirconium Carbide sputtering target 76.5mm Dia X 3.175mm thickness Zirconium Carbide sputtering target 76.5mm Dia X 6/35mm thickness Zirconium Carbide sputtering target 101.6mm Dia X 3.175mm thickness Zirconium Carbide sputtering target 101.6mm Dia X 6.35mm thickness Zirconium Carbide sputtering target 127mm Dia X 3.175mm thickness Zirconium Carbide sputtering target 127mm Dia X 6.35mm thickness Zirconium Carbide sputtering target 152.4mm Dia X 3.175mm thickness Zirconium Carbide sputtering target 152.4mm Dia X 6.35mm thickness Zirconium Carbide sputtering target 177.8mm Dia X 3.175mm thickness Zirconium Carbide sputtering target 177.8mm Dia X 6.35mm thickness Zirconium Carbide sputtering target 203.2mm Dia X 3.175mm thickness Zirconium Carbide sputtering target 203.2mm Dia X 6.35mm thickness Custom-made Application: Dielectric coating, Multilayers
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Our Advantage about Zirconium Carbide Sputtering targets (ZrC target) China rare metal material co.,limited (CRM) is an experter in manufacture Zirconium Carbide ceramic sputtering targets as Coating material . All Zirconium Carbide ceramic sputtering targets are manufacture by programs with with the highest possible density and smallest possible average grain size.. CRM material co.,limited is specialized in making virous Ceramic sputtering targets. We have many raw material compounds line, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special pellets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship. All Zirconium Carbide ceramic sputtering targets are analyzed using best detection means including chemical analysis, Crystal phase microscope, x ray diffraction(XRD), X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). |
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Reference Information about Zirconium Carbide (ZrC) Sputtering targets ZrC is a important high temperature structure materials with high melting point, high strength and anti-corrosion. And it can absorb visible light, reflect infrared rays and store up energy efficiently. It also has anti high temperature, anti-oxidation, high strength, high hardness, good thermal conductivity, good toughness and so on.. strong covalent Zr-C bond gives this material a very high melting point (~3530 °C), high modulus (~440 GPa) and hardness (25 GPa). ZrC has a lower density (6.73 g/cm3) compared to other carbides like WC (15.8 g/cm3), TaC (14.5 g/cm3) or HfC (12.67 g/cm3). ZrC seems suitable for use in re-entry vehicles, rocket/scramjet engines or supersonic vehicles in which low densities and high temperatures load-bearing capabilities are crucial requirements. Like most carbides of refractory metals, zirconium carbide is sub-stoichiometric, i.e., it contains carbon vacancies. At carbon contents higher than approximately ZrC0.98 the material contains free carbon. ZrC is stable for a carbon-to-metal ratio ranging from 0.65 to 0.98. The group IVA metal carbides, TiC, ZrC, and SiC are practically inert toward attack by strong aqueous acids (HCl) and strong aqueous bases (NaOH) even at 100' C, however, ZrC does react with HF. The mixture of zirconium carbide and tantalum carbide is an important cermet material. Hafnium-free zirconium carbide and niobium carbide can be used as refractory coatings in nuclear reactors. Because of a low neutron absorption cross-section and weak damage sensitivity under irradiation, it finds use as the coating of uranium dioxide and thorium dioxide particles of nuclear fuel. The coating is usually deposited by thermal chemical vapor deposition in a fluidized bed reactor. It also has high emissivity and high current capacity at elevated temperatures rendering it as a promising material for use in thermo-photovoltaic radiators and field emitter tips and arrays. It is also used as an abrasive, in cladding, in cermets, incandescent filaments and cutting tools.
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Relation Products of Zirconium Carbide Sputtering targets (ZrC target) Boron Carbide(B4C) Sputtering Targets; Chromium Carbide (Cr3C2) Sputtering Targets; Hafnium Carbide(HfC) Sputtering Targets; Iron Carbide (Fe3C) Sputtering Targets; Molybdenum Carbide (Mo2C) Sputtering Targets; Niobium Nitride (NbC) Sputtering Targets; Silicom Carbide (SiC) Sputtering Targets; Tantalum Carbide (TaC) Sputtering Targets; Titanium Carbide(TiC) Sputtering Targets; Titanium Carbonitride (TiCN) Sputtering Targets; Tungsten Carbide (W2C) Sputtering Targets; Tungsten Carbide (WC) Sputtering Targets; Tungsten Carbide Doped with Nickel (WC+Ni); Tungsten Carbide Doped with Cobalt (WC+Co); Vanadium Carbide (VC) Sputtering Targets; Zirconium Carbide(ZrC) Sputtering Targets; Relation Material Zirconium Aluminium alloy - ZrAl Zirconium Niobium Alloy - ZrNb Zirconium Silicon Alloy - ZrSi Zirconium Ytterium Alloy - ZrY
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