| Zirconium Nitride (ZrN) Sputtering Targets | ||
Zirconium Nitride (ZrN) Sputtering targets Purity: 99.5% Manufacturing Process: Material synthesis ---> Milling ---> HP(Vacuum) ---> Machining ---> Checking ---> Packing Speciafication (Max): Planar circular target: Dia ≤480mm, Thickness ≥1mm Planar Rectangle target: Length ≤420mm, Width ≤270mm, Thickness ≥1mm) Rotary Target: Diameter≤ 200mm, Thickness >2mm) Avialable Size: ( in sotre ) Zirconium Disilicide sputtering target 25.4mm DiaX 3.175mm thickness Zirconium Disilicide sputtering target 25.4mm Dia X 6.35mm thickness Zirconium Disilicide sputtering target 50.8mm DiaX 3.175mm thickness Zirconium Disilicide sputtering target 50.8mm Dia X 6.35mm thickness Zirconium Disilicide sputtering target 76.5mm Dia X 3.175mm thickness Zirconium Disilicide sputtering target 76.5mm Dia X 6/35mm thickness Zirconium Disilicide sputtering target 101.6mm Dia X 3.175mm thickness Zirconium Disilicide sputtering target 101.6mm Dia X 6.35mm thickness Zirconium Disilicide sputtering target 127mm Dia X 3.175mm thickness Zirconium Disilicide sputtering target 127mm Dia X 6.35mm thickness Zirconium Disilicide sputtering target 152.4mm Dia X 3.175mm thickness Zirconium Disilicide sputtering target 152.4mm Dia X 6.35mm thickness Zirconium Disilicide sputtering target 177.8mm Dia X 3.175mm thickness Zirconium Disilicide sputtering target 177.8mm Dia X 6.35mm thickness Zirconium Disilicide sputtering target 203.2mm Dia X 3.175mm thickness Zirconium Disilicide sputtering target 203.2mm Dia X 6.35mm thickness Custom-made Application: |
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Our Advantage about Zirconium Nitride (ZrN) Sputtering targets China rare metal material co.,limited (CRM) is an experter in manufacture Zirconium Nitride ceramic sputtering targets as Coating material . All Zirconium Nitride ceramic sputtering targets are manufacture by programs with with the highest possible density and smallest possible average grain size.. CRM material co.,limited is specialized in making virous Ceramic sputtering targets. We have many raw material compounds line, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special pellets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship. All Zirconium Nitride ceramic sputtering targets are analyzed using best detection means including chemical analysis, Crystal phase microscope, x ray diffraction(XRD), X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). |
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Reference Information of Zirconium Nitride (ZrN) Sputtering targets Zirconium nitride (ZrN) is an inorganic compound used in a variety of ways due to its properties. Zirconium nitride is a hard ceramic material similar to titanium nitride and is a cement-like refractory material. Thus it is used in refractories, cermets and laboratory crucibles. When applied using the physical vapor deposition coating process it is commonly used for coating medical devices, industrial parts (notably drill bits), automotive and aerospace components and other parts subject to high wear and corrosive environments. Also zirconium nitride was suggested as a hydrogen peroxide fuel tank liner for rockets and aircraft.
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Relation Products of Zirconium Nitride (ZrN) Sputtering targets Zirconium Aluminium alloy - ZrAl Zirconium Niobium Alloy - ZrNb |

