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Zirconium Nickel (ZrNi) Alloy Sputtering Targets |
Zirconium Nickel (ZrNi) Alloy Sputtering Targets Purity: 99.9%, component: Zr-Ni 70/30, 50/50, 30/70, custom-made Manufacturing Process Melting ---> Casting ---> Forging (Rolling) ---> Machining ---> Checking ---> Packing Speciafication (Max) Planar circular target: Dia ≤480mm, Thickness ≥1mm Planar Rectangle: Length ≤1800mm, Width ≤300mm, Thickness ≥1mm) Totary Target: Diameter≤ 200mm, Thickness >2mm) Application --- Primary used as decorate thin film , hard thin film |
Our Advantage of Zirconium Nickel Sputtering Targets (ZrY Target) China rare metal material co.,limited (CRM) is an experter in manufacture Zirconium Nickel Alloy sputtering targets as evaporation material . All Zirconium Nickel Alloy sputtering targets are manufacture by programs with with the highest possible density and smallest possible average grain size.. CRM material co.,limited is specialized in making virous Alloy sputtering targets. We have many raw material compounds line, such as semiconductor line, chemical compounds line, metallurgy line, powder milling line, etc. Moreover, we introduced many advanced technology and equipments from related companies at home and aborad. We also have an experienced research team who have developed many new and special pellets, and also successfully made many trial orders and received many customers satisfaction and long-term friendship. All Zirconium Nickel Alloy sputtering targets are analyzed using best detection means including chemical analysis, Crystal phase microscope, x ray diffraction(XRD), X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). |
Zirconium Nickel (ZrNi) Alloy phase diagram
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Relation Material of Zirconium Nickel (ZrNi) Alloy Sputtering Targets Zirconium Aluminium alloy - ZrAl Zirconium Niobium Alloy - ZrNb |
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