Zirconium nitride (ZrN) is an inorganic compound used in a variety of ways due to its properties.
ZrN grown by physical vapor deposition (PVD) is a light gold color similar to elemental gold. ZrN has a room-temperature electrical resistivity of 12.0 µΩ·cm, a temperature coefficient of resistivity of 5.6·10−8 Ω·cm/K, a superconducting transition temperature of 10.4 K, and a relaxed lattice parameter of 0.4575 nm. The hardness of single-crystal ZrN is 22.7±1.7 GPa and elastic modulus is 450 GPa.

Zirconium nitride is a hard ceramic material similar to titanium nitride and is a cement-like refractory material. Thus it is used in refractories, cermets and laboratory crucibles. When applied using the physical vapor deposition coating process it is commonly used for coating medical devices, industrial parts (notably drill bits), automotive and aerospace components and other parts subject to high wear and corrosive environments.

Also zirconium nitride was suggested as a hydrogen peroxide fuel tank liner for rockets and aircraft.

Base information

Zirconium nitride,Zirconium(III) nitride, Nitridozirconium
CAS Number:25658-42-8

ChemSpider:85159
ECHA InfoCard:100.042.864
EC Number:247-166-2
PubChem CID:94359
Chemical formula:ZrN
Appearance:Yellow-brown crystals
Odor:Odorless
Density:7.09 g/cm3 (24 °C)
Melting point:2,952 °C (5,346 °F; 3,225 K) at 760 mmHg

Zirconium Niteide (ZrN) Sputtering targets

Purity--- 99.5%

Shape --- Discs, Plate, Step (Dia ≤480mm, Thickness ≥2mm)

Rectangle, Sheet, Step (Length ≤400mm, Width ≤300mm, Thickness ≥2mm)

Zirconium Niteide (ZrN) Evaporation Material

Purity --- 99.5%

Granule1-3mm,1-6mm

Zirconium Niteide (ZrN) Powder 

Purity---99.5%

Size --- 100-300 mesh

Relation Products:

Aluminum Nitride (AlN) Sputtering Targets;

Boron Nitride (BN) Sputtering Targets;

Chrominium Nitride (CrN) Sputtering Targets;

Gallium Nitride (GaN) Sputtering Targets;

Germanium Nitride (Ge3N4) Sputtering targets;

Hafnium Nitride (HfN) Sputtering Targets;

Magnesium Nitride (Mg2N3) Sputtering Targets;

Niobium Niride (NbN) Sputtering Targets;

Silicom Nitride (Si3N4) Sputtering Targets;

Tantalum Nitride (TaN) Sputtering Targets;

Titanium Carbonitride (TiCN);

Titanium Nitride(TiN) Sputtering Targets;

Vanadium Nitride (VN) Sputtering Targets;

Zirconium Nitride (ZrN) Sputtering Targets;