Boron is a non metallic element and the only non-metal of the group 13 of the periodic table the elements. Boron is electron-deficient, possessing a vacant p-orbital. It has several forms, the most common of which is amorphous boron, a dark powder, unreactive to oxygen, water, acids and alkalis. It reacts with metals to form borides.
At standard temperatures boron is a poor electrical conductor but is a good conductor at high temperatures.

Basic Information

Boron Sputtering Target ( B Target )

Purity---  99.9%, 99.99%

Shape--- Discs, Plate, Step ( Dia ≤480mm, Thickness ≥ 1mm)

                Rectangle, Sheet,  Step ( Length≤410mm,Width ≤300mm, Thickness ≥1mm)

                Tube( Diameter< 300mm,  Thickness >2mm, )

Application --- Semiconductor,  Diffusion layer.

High Purity Boron (B) Metals

Purity --- 99.5%,99.9%,99.99%

Shape --- Crystal  Powder, Crystal Block, Amorphism Block (5N, 6N), Amorphism Powder(5N, 6N)

Application --- neutron absorber and neutron counter in nuclear reactor, catalyst in ceramics industry and organic synthesis, high energy fuel in solid rocket propellants, ignitor in electronic industry, safety air cell initiator for automobile, synthesize all kinds of boron compounds with high purity, Smelting of some kind of alloy steel, materials for producing boron fiber, gas scavenger in molten copper, fireworks industry, gas scavenger in molten copper.

Relation Products:

Boron sputtering targets - B;

Boron carbide sputtering target - B4C;

Boron Nitride sputtering target - BN;

Aluminium Diboride Sputtering target - AlB2;

Cerium Hexaboride sputtering targets - CeB6;

Chrominium Boride sputtering targets - CrB；

Cobalt Boride sputtering target - CoB;

Hafnium Diboride (HfB2) Sputtering Target - HfB2;

Iron Boride sputtering targets - FeB;

Lathanum Hexaboride sputtering targets - LaB6;

Magnesium Diboride sputtering targets - MgB2;

Molybdenum Diboride sputtering targets - MoB2;

Neodymium Boride (NdB) Sputtering Target;

Niobium Diboride (NbB2) Sputtering target - NbB2;

Nickel Boride sputtering targets -Ni2B;

Tantalum Diboride Sputterng target - TaB2;

Titanium Aluminum Boron Sputtering Targets - TiAlB;

Titanium Diboride sputtering targets - TiB2;

Tungsten Diboride Sputtering tarets - WB2;

Vanadium Boride (VB2) Sputtering Target - VB / VB2;

Zirconium Diboride Sputtering targets - ZrB2;