Carbon(C) Element
| Basic Information | |
| Name: Carbon Symbol: C Atomic Number: 6 Atomic Mass: 12.0107 amu Melting Point: 3500.0 °C (3773.15 °K, 6332.0 °F) Boiling Point: 4827.0 °C (5100.15 °K, 8720.6 °F) |
Number
of Protons/Electrons: 6 Number of Neutrons: 6 Classification: Non-metal Crystal Structure: Hexagonal Density @ 293 K: 2.62 g/cm3 Color: May be black |
Product List
Metals & Alloys (Top)
| Name | Purity | Shape |
| Carbon (C) | 99.99% | Rod, Sheet, Plate, Crucible, Pellet, Sputtering Target |
| Pyrolytic Graphite (PG) | 99.998% | Rod, Sheet, Plate, Crucible, Pellet, Sputtering Target |
Compounds (Top)
| Name | Purity | Shape |
| Boron carbide (B4C) | 99.5 | Sputtering Target, Evaporation material, Powders(40-300mesh) |
Cerium Carbide (CeC2) |
99.9% |
Sputtering Target, Evaporation material, Powders(40-300mesh) |
Chromium Carbide (Cr3C2) |
99.9% |
Sputtering Target, Evaporation material, Powders(40-300mesh) |
Chromium Carbonitride (CrCN) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Cobalt Carbide (CoC) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Cobalt Carbide (Co2C) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Cobalt Carbide (Co3C) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Copper Carbide (CoC2) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
| Dysprosium Carbide (DyC2) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Dysprosium Carbide (Dy2C3) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Dysprosium Carbide (Dy3C) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Erbium Carbide (ErC2) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Erbium Carbide (Er2C3) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Erbium Carbide (Er3C) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Europium Carbide (EuC) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Europium Carbide (EuC2) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Gadolinium Carbide (GdC2) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Gadolinium Carbide (Gd2C3) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Gadolinium Carbide (Gd3C) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Germanium Ccarbide (GeC) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Hafnium Carbide (HfC) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Holminum Carbide (HoC2) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Holminum Carbide (Ho2C3) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Holminum Carbide (Ho3C) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Iron carbide (Fe3C) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Lanthanium Carbide (LaC2) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Lanthanium Carbide (La2C3) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Lutetium Carbide (LuC2) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Lutetiium Carbide (Lu2C3) | 99.9% | Sputtering Target, Evaporation material, powders(40-300mesh) |
| Molybdenum Carbide (Mo2C) | 99.95 | Sputtering Target, Evaporation material, powders(40-300mesh) |
Neodymium Carbide (NdC2) |
99.95% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Nickel Carbide (Ni3C) |
99.95% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Niobium Carbide (NbC) |
99.95% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Diniobium Carbide (Nb2C) |
99.95% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Diniobium Carbide (Nb4C3) |
99.95% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
| Praseodymium Carbide (Pr2C) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Praseodymium Carbide (PrC2) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Praseodymium Carbide (Pr2C3) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Samarium Carbide (Sm2C) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Samarium Carbide (SmC2) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Samarium Carbide (Sm2C3) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Scandium Carbide (Sc2C3) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Scandium Carbide (Sc2C) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Scandium Carbide (ScC2) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Silicon Carbide (SiC) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
Tantalum Carbide (TaC) |
99.95% |
Sputtering Target, Evaporation material, powders(200-300mesh) |
Tantalum Carbide (Ta2C) |
99.95% |
Sputtering Target, Evaporation material, powders(200-300mesh) |
Tantalum Carbide (Ta4C3) |
99.95% |
Sputtering Target, Evaporation material, powders(200-300mesh) |
Terbium Carbide (Tb2C) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Terbium Carbide (TbC2) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Terbium Carbide (Tb2C3) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Thulium Carbide (Tm2C) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Thulium Carbide (TmC2) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Thulium Carbide (Tm2C3) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Titanium Carbide (TiC) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
Titanium Carbonitride (TiCN) |
99.9% |
Sputtering Target, Evaporation material, powders(40-300mesh) |
| Tungsten Carbide (WC) | 99.95% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Ditungsten Carbide (W2C) | 99.95% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Tungsten Carbide -cobalt (WC - 6 wt. % Co) | 99.95% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Tungsten Carbide -cobalt (W2C - 12 wt. % Co) | 99.95% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Vanadium Carbide (VC) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Vanadium Carbide (V2C) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Vanadium Aluminum Carbide (V2AlC) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
| Vanadium Carbide (V4C3) | 99.9% | Sputtering Target, Evaporation material, powders(200-300mesh) |
Ytterbium Carbide (Yb2C) |
99.95% |
Sputtering Target, Evaporation material, powders(100-300mesh) |
Ytterbium Carbide (Yb4C3) |
99.95% |
Sputtering Target, Evaporation material, powders(100-300mesh) |
Ytterbium Carbide (Yb2C) |
99.95% |
Sputtering Target, Evaporation material, powders(100-300mesh) |
Yttrium Carbide (YC2) |
99.95% |
Sputtering Target, Evaporation material, powders(100-300mesh) |
Yttrium Carbide (Y4C3) |
99.95% |
Sputtering Target, Evaporation material, powders(100-300mesh) |
Yttrium Carbide (Y2C) |
99.95% |
Sputtering Target, Evaporation material, powders(100-300mesh) |
Zirconium Carbide (ZrC) |
99.95% |
Sputtering Target, Evaporation material, powders(100-300mesh) |
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