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Silicon Monoxide (SiO) |
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Silicon Monoxide Sputtering Target Purity--- 99.9%,99.99% Shape--- Discs, Plate,Step ( Dia ≤480mm,, Thickness ≥ 1mm) Rectangle, Sheet, Step (Length ≤400mm, Width ≤200mm, Thickness ≥1mm) |
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Silicon Monoxide Evaporation Material Density--- 2.13 g/cm3 Purity--- 99.9%,99.99% Melting point--- 1705 ℃, Vapour pressure at 1080℃ 1 Pa, at 1180℃ 10 Pa Properties of thin film--- Specification--- custom-made, Solubility Insoluble in water and soluble in hydrofluoric acid. Application--- Anti-reflection coatings, interference filters, jewel etc.. |
