Tantalum Pentoxide +Titanium Dioxide(Ta2O5+TiO2)

Tantalum pentoxide is Ta2O5, also known as tantalum(V) oxide. Both orthorhombic and hexagonal phases are known. Ta2O5 is a high refractive index, low absorption material useful for coatings in the near-UV to IR spectra regions; it decomposes only at temperatures >1470 °C.

Application: Ta2O5 is used to make capacitors in automotive electronics, cell phones, and pagers, electronic circuitry; thin-film components; and high-speed tools. In the 1990s, there was a very strong interest to do research on tantalum oxide as a high-k dielectric for DRAM capacitor applications. For example, Elpida Memory (a Japanese company making DRAM) has put in a strong effort to improve ultrathin tantalum oxide films for DRAM applications. Subsequently in the 2000s, this strong interest has dropped very significantly. It is being used in on-chip MIM capacitors for RF CMOS integrated circuits. Due to its high index of refraction, Ta2O5 has been utilized in the fabrication of the glass of many photographic lenses.

Basic Information

Tantalum Pentoxide doped Titanium Dioxide Sputtering Target - Ta2O5 deped TiO2 target

Purity--- 99.99%

Shape--- Discs, Plate, Step (Dia >≤300mm,,  Thickness >≥1mm)

                 Rectangle, Sheet,  Step (Length >≤1000mm, Width >≤300mm, Thickness >≥1mm)

Application --- Anti-reflection coatings, interference filters,  UV laser applications with silicon dioxide (n = 1.48),  Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.
Good news: CRM developed Ta2O5 sputtering target (black target) )for DC sputter..., don't need change your machine, also can got Ta2O5 thin film...

Tantalum Pentoxide + Titanium Dioxide Evaporation Material  - Ta2O5 deped TiO2 target
Shape---  Irregular pieces, pellet, 8-9 mm dia. x 4-5 mm thick sintered tablets,3-12 mm sintered pieces

Dimension---3-8mm   irregular pieces

Application---Anti-reflection coatings, interference filters,  UV laser applications with silicon dioxide (n = 1.48),  Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.

Relation products:

Silicon Dioxide sputtering target,

Strontium Titanate sputtering target

Titanium Dioxide sputtering target, TiOx target,

Tantalum Carbde sputtering target

Tantalum Pentoxide sputtering target, Ta2Ox target

Tantalum Pentoxide +Titanium Dioxide(Ta2O5+TiO2)

Tantalum Metal targets

Tantalum Nitride sputtering target

Zirconium Dioxide sputtering target - TiOx target